It is designed to improve sensitivity and repeatability in AFM measurements for materials science researchers and failure analysis engineers requiring high-accuracy and high-resolution measurements in a vacuum environment.
The Park NX-Hivac features a 50 µm x 50 µm XY scanner with an optional 100 µm x 100 µm upgrade.
Its inner vacuum chamber measures 300 mm x 420 mm x 320 mm and its outer vacuum (including granite and pump) measures 800 mm x 950 mm x 730 mm.
The vacuum level is typically less than 1x10-5 Torr, which the AFM reaches within five minutes of pumping.
Park System’s patented SmartScan software allows operators to perform 3D microscopy at nanoscale resolution with a point-and-click interface.
Users can conduct Scanning Spreading Resistance Microscopy (SSRM) under high-vacuum conditions, which reduces the required tip-sample interaction force, significantly reducing damage to both the sample and the tip.
This can extend the life of each tip, making scanning cheaper and more convenient, as well as providing more accurate results by improving spatial resolution and signal-to-noise ratio.
“Park NX-Hivac offers greater accuracy, better repeatability and less tip and sample damage than ambient or dry N2 conditions,” said Keibock Lee, President of Park Systems. “Our design allows users to measure a much wider range of signal responses in various failure analysis applications, such as dopant concentrations in SSRM.”
“High vacuum SSRM measurements conducted with the Park NX-Hivac guarantee failure analysis engineers substantial benefits including increased throughput and yield, cost reductions, and improved accuracy,” Lee concluded.
The AFM is being showcased at the American Physical Society (APS) March Meeting from March 14-18 2016 in Booth 917 at the Baltimore Convention Center.
For more information, visit the Park Systems website.